Reaction under vacancy-assisted diffusion at high quencher concentration
نویسندگان
چکیده
منابع مشابه
Vacancy-assisted diffusion in silicon: a three-temperature-regime model.
In this Letter we report kinetic lattice Monte Carlo simulations of vacancy-assisted diffusion in silicon. We show that the observed temperature dependence for vacancy migration energy is explained by the existence of three diffusion regimes for divacancies. This characteristic has been rationalized with an analytical model. In the intermediate temperature regime the divacancy dissociation play...
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ژورنال
عنوان ژورنال: Physical Review E
سال: 2009
ISSN: 1539-3755,1550-2376
DOI: 10.1103/physreve.80.041120